Developing Line

The development line is a process in which a chemical reaction erodes away the unwanted portion of the photopolymer coating, usually the copper-plated portion, leaving behind the circuit pattern that needs to be retained.

Main technical parameters
1.Overall specifications: length 5~15m, width 0.8~2m, height 1.5~3m.
2. Maximum working size: width 300~1200mm. board length 300~1500mm. thickness 0.1~3mm
3.Minimum processing size: 50mm×50mm
4.Developing speed: 0.5~5m/min
5.Energy consumption index: 5~30KW